Tunable near-field radiative transfer by III–V group compound semiconductors

عنوان Tunable near-field radiative transfer by III–V group compound semiconductors
نویسنده Elçioğlu, E. B., Didari, Azadeh, Özyurt, T. O., Mengüç, Mustafa Pınar
تاریخ انتشار: 2019-03-06
محل انتشار - IOP Publishing
موضوع Near-field thermal radiation, Energy harvesting, Wafer material, Doping
نوع دوره ای
زبان انگلیسی
دیجیتال بله
نسخه خطی خیر
کتابخانه: دانشگاه اوزیغین
شناسه دارایی کتابخانه 0022-3727
شماره ثبت ff65a97b-96ff-4109-97f1-38482657707c
محل کتابخانه Mechanical Engineering
تاریخ 2019-03-06
یادداشت‌ها TÜBİTAK ; Center for Energy, Environment and Economy (CEEE) at Ozyegin University, Istanbul, Turkey
متن نمونه Near-field radiative transfer (NFRT) refers to the energy transfer mechanism which takes place between media separated by distances comparable to or much smaller than the dominant wavelength of emission. NFRT is due to the contribution of evanescent waves and coherent nature of the energy transfer within nano-gaps, and can exceed Planck's blackbody limit. As researchers further investigate this phenomenon and start fabrication of custom-made platforms, advances in utilization of NFRT in energy harvesting applications move forward day by day. In designing and manufacturing such harvesting devices, chemical and physical properties of surfaces and wafers are important for development of effective solutions. In this work, we compare several III-V group compound semiconductor wafers (mainly GaAs, InSb, and InP) from fabrication point of view, in order to explore their possible use in future devices. The results presented here show that the type of dopant, wafer temperature, and gap size are very important factors as they affect the NFRT rates. GaAs, InSb, and InP wafers significantly enhance the near-field fluxes beyond the blackbody rates, and n-type InSb yields to the highest enhancement. For GaAs, p-type yielded a higher radiative flux compared to n-type GaAs, as oppose to n-type InSb outperforming its p-type and undoped counterparts. Furthermore, the possible use of n-InSb as the TPV cell at 550K is discussed for effective energy harvesting. These findings can be useful for determination of the proper material type for emitting and non-emitting NFRT-based energy harvesting devices.
DOI 10.1088/1361-6463/aaf947
Cilt 52
مشاهده در منبع دانشگاه اوزیغین دانشگاه اوزیغین - موتور جستجوی نسخه های خطی عثمانی
دانشگاه اوزیغین - موتور جستجوی نسخه های خطی عثمانی دانشگاه اوزیغین

Tunable near-field radiative transfer by III–V group compound semiconductors

نویسنده Elçioğlu, E. B., Didari, Azadeh, Özyurt, T. O., Mengüç, Mustafa Pınar
تاریخ انتشار 2019-03-06
محل انتشار - IOP Publishing
موضوع Near-field thermal radiation, Energy harvesting, Wafer material, Doping
نوع دوره ای
زبان انگلیسی
دیجیتال بله
نسخه خطی خیر
کتابخانه دانشگاه اوزیغین
شناسه دارایی کتابخانه 0022-3727
شماره ثبت ff65a97b-96ff-4109-97f1-38482657707c
محل کتابخانه Mechanical Engineering
تاریخ 2019-03-06
یادداشت‌ها TÜBİTAK ; Center for Energy, Environment and Economy (CEEE) at Ozyegin University, Istanbul, Turkey
متن نمونه Near-field radiative transfer (NFRT) refers to the energy transfer mechanism which takes place between media separated by distances comparable to or much smaller than the dominant wavelength of emission. NFRT is due to the contribution of evanescent waves and coherent nature of the energy transfer within nano-gaps, and can exceed Planck's blackbody limit. As researchers further investigate this phenomenon and start fabrication of custom-made platforms, advances in utilization of NFRT in energy harvesting applications move forward day by day. In designing and manufacturing such harvesting devices, chemical and physical properties of surfaces and wafers are important for development of effective solutions. In this work, we compare several III-V group compound semiconductor wafers (mainly GaAs, InSb, and InP) from fabrication point of view, in order to explore their possible use in future devices. The results presented here show that the type of dopant, wafer temperature, and gap size are very important factors as they affect the NFRT rates. GaAs, InSb, and InP wafers significantly enhance the near-field fluxes beyond the blackbody rates, and n-type InSb yields to the highest enhancement. For GaAs, p-type yielded a higher radiative flux compared to n-type GaAs, as oppose to n-type InSb outperforming its p-type and undoped counterparts. Furthermore, the possible use of n-InSb as the TPV cell at 550K is discussed for effective energy harvesting. These findings can be useful for determination of the proper material type for emitting and non-emitting NFRT-based energy harvesting devices.
DOI 10.1088/1361-6463/aaf947
Cilt 52
دانشگاه اوزیغین - موتور جستجوی نسخه های خطی عثمانی
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