Tunable near-field radiative transfer by III–V group compound semiconductors

Title Tunable near-field radiative transfer by III–V group compound semiconductors
Author Elçioğlu, E. B., Didari, Azadeh, Özyurt, T. O., Mengüç, Mustafa Pınar
Publication Date: 2019-03-06
Publication Place - IOP Publishing
Subject Near-field thermal radiation, Energy harvesting, Wafer material, Doping
Type Periodical
Language English
Digital Yes
Manuscript No
Library: Özyeğin University
Library Asset ID 0022-3727
Record ID ff65a97b-96ff-4109-97f1-38482657707c
Library Location Mechanical Engineering
Date 2019-03-06
Notes TÜBİTAK ; Center for Energy, Environment and Economy (CEEE) at Ozyegin University, Istanbul, Turkey
Sample Text Near-field radiative transfer (NFRT) refers to the energy transfer mechanism which takes place between media separated by distances comparable to or much smaller than the dominant wavelength of emission. NFRT is due to the contribution of evanescent waves and coherent nature of the energy transfer within nano-gaps, and can exceed Planck's blackbody limit. As researchers further investigate this phenomenon and start fabrication of custom-made platforms, advances in utilization of NFRT in energy harvesting applications move forward day by day. In designing and manufacturing such harvesting devices, chemical and physical properties of surfaces and wafers are important for development of effective solutions. In this work, we compare several III-V group compound semiconductor wafers (mainly GaAs, InSb, and InP) from fabrication point of view, in order to explore their possible use in future devices. The results presented here show that the type of dopant, wafer temperature, and gap size are very important factors as they affect the NFRT rates. GaAs, InSb, and InP wafers significantly enhance the near-field fluxes beyond the blackbody rates, and n-type InSb yields to the highest enhancement. For GaAs, p-type yielded a higher radiative flux compared to n-type GaAs, as oppose to n-type InSb outperforming its p-type and undoped counterparts. Furthermore, the possible use of n-InSb as the TPV cell at 550K is discussed for effective energy harvesting. These findings can be useful for determination of the proper material type for emitting and non-emitting NFRT-based energy harvesting devices.
DOI 10.1088/1361-6463/aaf947
Cilt 52
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Tunable near-field radiative transfer by III–V group compound semiconductors

Author Elçioğlu, E. B., Didari, Azadeh, Özyurt, T. O., Mengüç, Mustafa Pınar
Publication Date 2019-03-06
Publication Place - IOP Publishing
Subject Near-field thermal radiation, Energy harvesting, Wafer material, Doping
Type Periodical
Language English
Digital Yes
Manuscript No
Library Özyeğin University
Library Asset ID 0022-3727
Record ID ff65a97b-96ff-4109-97f1-38482657707c
Library Location Mechanical Engineering
Date 2019-03-06
Notes TÜBİTAK ; Center for Energy, Environment and Economy (CEEE) at Ozyegin University, Istanbul, Turkey
Sample Text Near-field radiative transfer (NFRT) refers to the energy transfer mechanism which takes place between media separated by distances comparable to or much smaller than the dominant wavelength of emission. NFRT is due to the contribution of evanescent waves and coherent nature of the energy transfer within nano-gaps, and can exceed Planck's blackbody limit. As researchers further investigate this phenomenon and start fabrication of custom-made platforms, advances in utilization of NFRT in energy harvesting applications move forward day by day. In designing and manufacturing such harvesting devices, chemical and physical properties of surfaces and wafers are important for development of effective solutions. In this work, we compare several III-V group compound semiconductor wafers (mainly GaAs, InSb, and InP) from fabrication point of view, in order to explore their possible use in future devices. The results presented here show that the type of dopant, wafer temperature, and gap size are very important factors as they affect the NFRT rates. GaAs, InSb, and InP wafers significantly enhance the near-field fluxes beyond the blackbody rates, and n-type InSb yields to the highest enhancement. For GaAs, p-type yielded a higher radiative flux compared to n-type GaAs, as oppose to n-type InSb outperforming its p-type and undoped counterparts. Furthermore, the possible use of n-InSb as the TPV cell at 550K is discussed for effective energy harvesting. These findings can be useful for determination of the proper material type for emitting and non-emitting NFRT-based energy harvesting devices.
DOI 10.1088/1361-6463/aaf947
Cilt 52
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