Author
Karagöz, Ayşe, Başım, Gül Bahar
Publication Date
2014
Publication Place
-
ECS
Type
Document
Language
English
Digital
Yes
Manuscript
No
Library
Özyeğin University
Library Asset ID
2-s2.0-84925339915
Record ID
a164f709-c2a6-49ab-a737-f59ad101a8a8
Library Location
Mechanical Engineering
Date
2014
Notes
Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Sample Text
In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical planarization applications. It was observed that the very strong or loose self-assembled surfactant structures can help obtain selectivity on the silica/germanium systems. Simultaneously, good defectivity control with a sufficient material removal rate was obtained. The surface charges manipulated by the surfactant adsorption and the hydrophobic nature of the germanium surface were main criteria on the selection of the proper surfactant/oxidizer system. In addition, impact of surfactant addition on particle-particle interactions controlling slurry stability was also investigated in the paper.
DOI
10.1149/06117.0037ecst
Cilt
61
