Tailoring silica nanotribology for CMP slurry optimization: Ca2+ cation competition in C12TAB mediated lubrication

Title Tailoring silica nanotribology for CMP slurry optimization: Ca2+ cation competition in C12TAB mediated lubrication
Author Vakarelski, I. U., Brown, S. C., Başım, Gül Bahar, Rabinovich, Y. I., Moudgil, B. M.
Publication Date: 2010-04-12
Publication Place - ACS
Subject Chemical mechanical planarization (CMP), Atomic force microscopy (AFM), Tribology, Surfactants
Type Periodical
Language English
Digital Yes
Manuscript No
Library: Özyeğin University
Library Asset ID 1944-8244
Record ID 210f7d05-584a-4183-8c34-537318d9ea45
Library Location Mechanical Engineering
Date 2010-04-12
Notes Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Sample Text Self-assembled surfactant structures at the solid/liquid interface have been shown to act as nanoparticulate dispersants and are capable of providing a highly effective, self-healing boundary lubrication layer in aqueous environments. However, in some cases in particular, chemical mechanical planarization (CMP) applications the lubrication imparted by self-assembled surfactant dispersants can be too strong, resulting in undesirably low levels of wear or friction disabling material removal. In the present investigation, the influence of calcium cation (Ca2+) addition on dodecyl trimethylammonium bromide (C12TAB) mediated lubrication of silica surfaces is examined via normal and lateral atomic force microscopy (AFM/LFM), benchtop polishing experiments and surface adsorption characterization methods. It is demonstrated that the introduction of competitively adsorbing cations that modulate the surfactant headgroup surface affinity can be used to tune friction and wear without compromising dispersion stability. These self-healing, reversible, and tunable tribological systems are expected to lead to the development of smart surfactant-based aqueous lubrication schemes, which include designer polishing slurries and devices that take advantage of pressure-gated friction response phenomena.
DOI 10.1021/am100070e
Cilt 2
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Tailoring silica nanotribology for CMP slurry optimization: Ca2+ cation competition in C12TAB mediated lubrication

Author Vakarelski, I. U., Brown, S. C., Başım, Gül Bahar, Rabinovich, Y. I., Moudgil, B. M.
Publication Date 2010-04-12
Publication Place - ACS
Subject Chemical mechanical planarization (CMP), Atomic force microscopy (AFM), Tribology, Surfactants
Type Periodical
Language English
Digital Yes
Manuscript No
Library Özyeğin University
Library Asset ID 1944-8244
Record ID 210f7d05-584a-4183-8c34-537318d9ea45
Library Location Mechanical Engineering
Date 2010-04-12
Notes Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Sample Text Self-assembled surfactant structures at the solid/liquid interface have been shown to act as nanoparticulate dispersants and are capable of providing a highly effective, self-healing boundary lubrication layer in aqueous environments. However, in some cases in particular, chemical mechanical planarization (CMP) applications the lubrication imparted by self-assembled surfactant dispersants can be too strong, resulting in undesirably low levels of wear or friction disabling material removal. In the present investigation, the influence of calcium cation (Ca2+) addition on dodecyl trimethylammonium bromide (C12TAB) mediated lubrication of silica surfaces is examined via normal and lateral atomic force microscopy (AFM/LFM), benchtop polishing experiments and surface adsorption characterization methods. It is demonstrated that the introduction of competitively adsorbing cations that modulate the surfactant headgroup surface affinity can be used to tune friction and wear without compromising dispersion stability. These self-healing, reversible, and tunable tribological systems are expected to lead to the development of smart surfactant-based aqueous lubrication schemes, which include designer polishing slurries and devices that take advantage of pressure-gated friction response phenomena.
DOI 10.1021/am100070e
Cilt 2
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