Back to Search

A Monte Carlo simulation for phonon transport within silicon structures at nanoscales with heat generation

Title	A Monte Carlo simulation for phonon transport within silicon structures at nanoscales with heat generation
Author	Wong, B. T., Francoeur, M., Mengüç, Mustafa Pınar
Publication Date:	2011-04
Publication Place	- Elsevier
Subject	Monte Carlo, Phonon transport, Silicon thin film, Heat generation, Ballistic transport, Near-field thermal radiation, The Fourier law, Heat diffusion equation
Type	Periodical
Language	English
Digital	Yes
Manuscript	No
Library:	Özyeğin University
Library Asset ID	0017-9310
Record ID	f4e73fa3-41ab-45aa-b89d-dd396ddbadcc
Library Location	Mechanical Engineering
Date	2011-04
Notes	the Kentucky Science and Engineering Foundation ; European Commission
Sample Text	Nanoscale phonon transport within silicon structures subjected to internal heat generation was explored. A Monte Carlo simulation was used. The simulation procedures differed from the current existing methods in which phonons below a predefined “reference temperature” were not accounted to reduce memory storage and computational resources. Results indicated that the heat diffusion equation significantly underestimates temperature distribution at nanoscales in the presence of an external heat source. Discussions on temperature distribution inside silicon thin film when heated by a pulsed laser, an electron beam or due to near-field thermal radiation effects were also provided.
DOI	10.1016/j.ijheatmasstransfer.2010.10.039
Cilt	54

View in source Özyeğin University Özyeğin University - Historical works, archives, and periodicals search engine

Özyeğin University

A Monte Carlo simulation for phonon transport within silicon structures at nanoscales with heat generation

Author Wong, B. T., Francoeur, M., Mengüç, Mustafa Pınar

Publication Date 2011-04

Publication Place - Elsevier

Subject Monte Carlo, Phonon transport, Silicon thin film, Heat generation, Ballistic transport, Near-field thermal radiation, The Fourier law, Heat diffusion equation

Type Periodical

Language English

Digital Yes

Manuscript No

Library Özyeğin University

Library Asset ID 0017-9310

Record ID f4e73fa3-41ab-45aa-b89d-dd396ddbadcc

Library Location Mechanical Engineering

Date 2011-04

Notes the Kentucky Science and Engineering Foundation ; European Commission

Sample Text Nanoscale phonon transport within silicon structures subjected to internal heat generation was explored. A Monte Carlo simulation was used. The simulation procedures differed from the current existing methods in which phonons below a predefined “reference temperature” were not accounted to reduce memory storage and computational resources. Results indicated that the heat diffusion equation significantly underestimates temperature distribution at nanoscales in the presence of an external heat source. Discussions on temperature distribution inside silicon thin film when heated by a pulsed laser, an electron beam or due to near-field thermal radiation effects were also provided.

DOI 10.1016/j.ijheatmasstransfer.2010.10.039

Cilt 54