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Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces

Title	Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
Author	Özdemir, Zeynep, Orhan, Orçun, Bebek, Özkan, Başım, Gül Bahar
Publication Date:	2014
Publication Place	- ECS
Type	Document
Language	English
Digital	Yes
Manuscript	No
Library:	Özyeğin University
Library Asset ID	1938-5862
Record ID	e4a14932-ca40-4aea-b6f2-8fce9d0fc260
Library Location	Mechanical Engineering
Date	2014
Notes	Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Sample Text	This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application on the dental implants. CMP helps produce implant surfaces that are cleaned from potentially contaminated surface layers by removing a nano-scale top layer while simultaneously creating a protective oxide film on the surface to limit any further contamination to minimize risk of infection. Hence, we propose CMP as a synergistic method of nano-structuring on the implant surfaces and focus on extending the process to a 3-D platform to implement it on the dental implants.
DOI	10.1149/06117.0021ecst
Cilt	61

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Özyeğin University

Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces

Author Özdemir, Zeynep, Orhan, Orçun, Bebek, Özkan, Başım, Gül Bahar

Publication Date 2014

Publication Place - ECS

Type Document

Language English

Digital Yes

Manuscript No

Library Özyeğin University

Library Asset ID 1938-5862

Record ID e4a14932-ca40-4aea-b6f2-8fce9d0fc260

Library Location Mechanical Engineering

Date 2014

Notes Due to copyright restrictions, the access to the full text of this article is only available via subscription.

Sample Text This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application on the dental implants. CMP helps produce implant surfaces that are cleaned from potentially contaminated surface layers by removing a nano-scale top layer while simultaneously creating a protective oxide film on the surface to limit any further contamination to minimize risk of infection. Hence, we propose CMP as a synergistic method of nano-structuring on the implant surfaces and focus on extending the process to a 3-D platform to implement it on the dental implants.

DOI 10.1149/06117.0021ecst

Cilt 61