Application of chemical mechanical polishing process on titanium based implants

Name: Application of chemical mechanical polishing process on titanium based implants
Author: Özdemir, Zeynep, Ozdemir, A., Başım, Gül Bahar

İsim	Application of chemical mechanical polishing process on titanium based implants
Yazar	Özdemir, Zeynep, Ozdemir, A., Başım, Gül Bahar
Basım Tarihi:	2016-11-01
Basım Yeri	- Elsevier
Konu	Implantable biomaterials, Surface structuring, Chemical mechanical polishing, Biocompatibility
Tür	Süreli Yayın
Dil	İngilizce
Dijital	Evet
Yazma	Hayır
Kütüphane:	Özyeğin Üniversitesi
Demirbaş Numarası	2-s2.0-84973603567
Kayıt Numarası	5df206fc-003c-41f3-af17-3cbb9bb52f68
Lokasyon	Mechanical Engineering
Tarih	2016-11-01
Notlar	Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Örnek Metin	Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand the impact of nano/micro roughness on cell attachment. Although, the currently utilized surface modification techniques are known to improve the amount of cell attachment, it is critical to control the level of attachment due to the fact that promotion of bioactivity is needed for prosthetic implants while the cardiac valves, which are also made of titanium, need demotion of cells attachment to be able to function. In this study, a new alternative is proposed to treat the implantable titanium surfaces by chemical mechanical polishing (CMP) technique. It is demonstrated that the application of CMP on the titanium surface helps in modifying the surface roughness of the implant in a controlled manner (inducing nano-scale smoothness or controlled nano/micro roughness). Simultaneously, it is observed that the application of CMP limits the bacteria growth by forming a protective thin surface oxide layer on titanium implants. It is further shown that there is an optimal level of surface roughness where the cell attachment reaches a maximum and the level of roughness is controllable through CMP.
DOI	10.1016/j.msec.2016.06.002
Cilt	68

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Application of chemical mechanical polishing process on titanium based implants

Yazar Özdemir, Zeynep, Ozdemir, A., Başım, Gül Bahar

Basım Tarihi 2016-11-01

Basım Yeri - Elsevier

Konu Implantable biomaterials, Surface structuring, Chemical mechanical polishing, Biocompatibility

Tür Süreli Yayın

Dil İngilizce

Dijital Evet

Yazma Hayır

Kütüphane Özyeğin Üniversitesi

Demirbaş Numarası 2-s2.0-84973603567

Kayıt Numarası 5df206fc-003c-41f3-af17-3cbb9bb52f68

Lokasyon Mechanical Engineering

Tarih 2016-11-01

Notlar Due to copyright restrictions, the access to the full text of this article is only available via subscription.

Örnek Metin Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand the impact of nano/micro roughness on cell attachment. Although, the currently utilized surface modification techniques are known to improve the amount of cell attachment, it is critical to control the level of attachment due to the fact that promotion of bioactivity is needed for prosthetic implants while the cardiac valves, which are also made of titanium, need demotion of cells attachment to be able to function. In this study, a new alternative is proposed to treat the implantable titanium surfaces by chemical mechanical polishing (CMP) technique. It is demonstrated that the application of CMP on the titanium surface helps in modifying the surface roughness of the implant in a controlled manner (inducing nano-scale smoothness or controlled nano/micro roughness). Simultaneously, it is observed that the application of CMP limits the bacteria growth by forming a protective thin surface oxide layer on titanium implants. It is further shown that there is an optimal level of surface roughness where the cell attachment reaches a maximum and the level of roughness is controllable through CMP.

DOI 10.1016/j.msec.2016.06.002

Cilt 68