Improving selectivity on germanium CMP applications

Name: Improving selectivity on germanium CMP applications
Author: Karagöz, Ayşe, Başım, Gül Bahar

İsim	Improving selectivity on germanium CMP applications
Yazar	Karagöz, Ayşe, Başım, Gül Bahar
Basım Tarihi:	2014
Basım Yeri	- ECS
Tür	Belge
Dil	İngilizce
Dijital	Evet
Yazma	Hayır
Kütüphane:	Özyeğin Üniversitesi
Demirbaş Numarası	2-s2.0-84925339915
Kayıt Numarası	a164f709-c2a6-49ab-a737-f59ad101a8a8
Lokasyon	Mechanical Engineering
Tarih	2014
Notlar	Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Örnek Metin	In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical planarization applications. It was observed that the very strong or loose self-assembled surfactant structures can help obtain selectivity on the silica/germanium systems. Simultaneously, good defectivity control with a sufficient material removal rate was obtained. The surface charges manipulated by the surfactant adsorption and the hydrophobic nature of the germanium surface were main criteria on the selection of the proper surfactant/oxidizer system. In addition, impact of surfactant addition on particle-particle interactions controlling slurry stability was also investigated in the paper.
DOI	10.1149/06117.0037ecst
Cilt	61

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Improving selectivity on germanium CMP applications

Yazar Karagöz, Ayşe, Başım, Gül Bahar

Basım Tarihi 2014

Basım Yeri - ECS

Tür Belge

Dil İngilizce

Dijital Evet

Yazma Hayır

Kütüphane Özyeğin Üniversitesi

Demirbaş Numarası 2-s2.0-84925339915

Kayıt Numarası a164f709-c2a6-49ab-a737-f59ad101a8a8

Lokasyon Mechanical Engineering

Tarih 2014

Notlar Due to copyright restrictions, the access to the full text of this article is only available via subscription.

Örnek Metin In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical planarization applications. It was observed that the very strong or loose self-assembled surfactant structures can help obtain selectivity on the silica/germanium systems. Simultaneously, good defectivity control with a sufficient material removal rate was obtained. The surface charges manipulated by the surfactant adsorption and the hydrophobic nature of the germanium surface were main criteria on the selection of the proper surfactant/oxidizer system. In addition, impact of surfactant addition on particle-particle interactions controlling slurry stability was also investigated in the paper.

DOI 10.1149/06117.0037ecst

Cilt 61