Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces

Name: Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
Author: Özdemir, Zeynep, Orhan, Orçun, Bebek, Özkan, Başım, Gül Bahar

İsim	Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
Yazar	Özdemir, Zeynep, Orhan, Orçun, Bebek, Özkan, Başım, Gül Bahar
Basım Tarihi:	2014
Basım Yeri	- ECS
Tür	Belge
Dil	İngilizce
Dijital	Evet
Yazma	Hayır
Kütüphane:	Özyeğin Üniversitesi
Demirbaş Numarası	1938-5862
Kayıt Numarası	e4a14932-ca40-4aea-b6f2-8fce9d0fc260
Lokasyon	Mechanical Engineering
Tarih	2014
Notlar	Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Örnek Metin	This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application on the dental implants. CMP helps produce implant surfaces that are cleaned from potentially contaminated surface layers by removing a nano-scale top layer while simultaneously creating a protective oxide film on the surface to limit any further contamination to minimize risk of infection. Hence, we propose CMP as a synergistic method of nano-structuring on the implant surfaces and focus on extending the process to a 3-D platform to implement it on the dental implants.
DOI	10.1149/06117.0021ecst
Cilt	61

Kaynağa git Özyeğin Üniversitesi

Aramaya Dön

Özyeğin Üniversitesi

Kaynağa git

Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces

Yazar Özdemir, Zeynep, Orhan, Orçun, Bebek, Özkan, Başım, Gül Bahar

Basım Tarihi 2014

Basım Yeri - ECS

Tür Belge

Dil İngilizce

Dijital Evet

Yazma Hayır

Kütüphane Özyeğin Üniversitesi

Demirbaş Numarası 1938-5862

Kayıt Numarası e4a14932-ca40-4aea-b6f2-8fce9d0fc260

Lokasyon Mechanical Engineering

Tarih 2014

Notlar Due to copyright restrictions, the access to the full text of this article is only available via subscription.

Örnek Metin This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application on the dental implants. CMP helps produce implant surfaces that are cleaned from potentially contaminated surface layers by removing a nano-scale top layer while simultaneously creating a protective oxide film on the surface to limit any further contamination to minimize risk of infection. Hence, we propose CMP as a synergistic method of nano-structuring on the implant surfaces and focus on extending the process to a 3-D platform to implement it on the dental implants.

DOI 10.1149/06117.0021ecst

Cilt 61