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Biomaterials applications of chemical mechanical polishing

Title	Biomaterials applications of chemical mechanical polishing
Author	Başım, Gül Bahar, Özdemir, Zeynep, Mutlu, Ö.
Publication Date:	2012
Publication Place	- IEEE
Subject	CMP, Titanium implants, Biomaterials, Micro-patterning
Type	Document
Language	English
Digital	Yes
Manuscript	No
Library:	Özyeğin University
Library Asset ID	978-3-8007-3452-8
Record ID	e1a08db9-cd91-449d-9eb8-1f2ea356cfa4
Library Location	Mechanical Engineering
Date	2012
Notes	Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Sample Text	Chemical Mechanical Polishing (CMP) is used in semiconductor industry to enable planarization of the interlayer dielectrics and metals. In this study, CMP is used as a polishing technique to modify the surface roughness of the bio-implant materials in a controlled manner. As an alternative technique to sand-blasting/etching or laser structuring on the implant surfaces, CMP results in formation of a protective oxide layer on the titanium surfaces that can limit surface contamination while enabling surface nano-structuring that is known to promote bioactivity. Keywords: CMP, Titanium Implants, Biomaterials, Micro-Patterning.

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Özyeğin University

Biomaterials applications of chemical mechanical polishing

Author Başım, Gül Bahar, Özdemir, Zeynep, Mutlu, Ö.

Publication Date 2012

Publication Place - IEEE

Subject CMP, Titanium implants, Biomaterials, Micro-patterning

Type Document

Language English

Digital Yes

Manuscript No

Library Özyeğin University

Library Asset ID 978-3-8007-3452-8

Record ID e1a08db9-cd91-449d-9eb8-1f2ea356cfa4

Library Location Mechanical Engineering

Date 2012

Notes Due to copyright restrictions, the access to the full text of this article is only available via subscription.

Sample Text Chemical Mechanical Polishing (CMP) is used in semiconductor industry to enable planarization of the interlayer dielectrics and metals. In this study, CMP is used as a polishing technique to modify the surface roughness of the bio-implant materials in a controlled manner. As an alternative technique to sand-blasting/etching or laser structuring on the implant surfaces, CMP results in formation of a protective oxide layer on the titanium surfaces that can limit surface contamination while enabling surface nano-structuring that is known to promote bioactivity. Keywords: CMP, Titanium Implants, Biomaterials, Micro-Patterning.