Chemical mechanical polishing implementation on dental implants

Name: Chemical mechanical polishing implementation on dental implants
Author: Başım, Gül Bahar, Özdemir, Zeynep

İsim	Chemical mechanical polishing implementation on dental implants
Yazar	Başım, Gül Bahar, Özdemir, Zeynep
Basım Tarihi:	2015
Basım Yeri	- IEEE
Konu	Dentistry, Nanotechnology, Polishing, Prosthetics, Titanium
Tür	Belge
Dil	İngilizce
Dijital	Evet
Yazma	Hayır
Kütüphane:	Özyeğin Üniversitesi
Demirbaş Numarası	2-s2.0-84964556327
Kayıt Numarası	9857cd6e-090e-4d92-8ff0-ceb859ffda56
Lokasyon	Mechanical Engineering
Tarih	2015
Notlar	Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Örnek Metin	In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns induced on biomaterial surfaces promote bio-compatibility by increasing the capability of cell attachment. However, current developments on biomaterials highlight the impact of nano-scale roughness in promoting the biocompatibility on the metallic implant surfaces. CMP process brings the advantage of inducing smoothness or controlled nano-structures on the bio-implant material surfaces. Here, we focus particularly on the dental implant applications to change the surface roughness and the resulting bioactivity in a controlled manner.

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Chemical mechanical polishing implementation on dental implants

Yazar Başım, Gül Bahar, Özdemir, Zeynep

Basım Tarihi 2015

Basım Yeri - IEEE

Konu Dentistry, Nanotechnology, Polishing, Prosthetics, Titanium

Tür Belge

Dil İngilizce

Dijital Evet

Yazma Hayır

Kütüphane Özyeğin Üniversitesi

Demirbaş Numarası 2-s2.0-84964556327

Kayıt Numarası 9857cd6e-090e-4d92-8ff0-ceb859ffda56

Lokasyon Mechanical Engineering

Tarih 2015

Notlar Due to copyright restrictions, the access to the full text of this article is only available via subscription.

Örnek Metin In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns induced on biomaterial surfaces promote bio-compatibility by increasing the capability of cell attachment. However, current developments on biomaterials highlight the impact of nano-scale roughness in promoting the biocompatibility on the metallic implant surfaces. CMP process brings the advantage of inducing smoothness or controlled nano-structures on the bio-implant material surfaces. Here, we focus particularly on the dental implant applications to change the surface roughness and the resulting bioactivity in a controlled manner.